For some decades the world has observed the ultimate impact of device miniaturisation, which has led to a dramatic growth in national and global revenues alongside enormous benefits brought to human activities, in healthcare/medical, energy, space, transport, communication and defence sectors. Evolving initially from silicon-based manufacturing technologies thanks to huge investment and established infrastructure, the current state-of-the-art is characterised by moving further according to “More than Moore” and has substantially extended global capacity, achieving complex microsystem integration using hybrid processes, multi-materials that are confined in ever smaller spaces or dimensions. The bottlenecks and challenges in the endeavour of continuous miniaturisation thus exist in the fundamental understanding of underpinning phenomena to support the paradigm of future-generation miniaturised devices. In particular, with wider range of technology, novel materials and fabrication processes being available, the challenges yet still exist in elaborating the fundamental aspects of the materials interfacial interactions which will ultimately govern the functionality and reliability of any integrated devices. This talk is intended to demonstrate the how the fundamental research can serve such a purpose through several case studies.
Prof. Liu received his BEng from Nanjing University of Science and Technology (1985); MSc from the Chinese Academy of Science (1988) of China, and PhD in Hull University, UK (1998). He has worked as assistant professor in the Institute of Metals Research of Academia Sinica and as a Postdoctoral Researcher in the IRC in Materials, Birmingham University. From 2000 he joined the Wolfson School of Mechanical and Manufacturing Engineering at Loughborough University, where he is now Professor of Electronics Manufacture. His current research focuses on novel materials and innovative manufacturing processes to enable multifunctional device miniaturisation. He has published over 180 technical papers, and currently is a senior IEEE member.
|Date:||21 Dec 2012 (Friday)|
|Time:||11:00am – 11:45am|
|Venue:||P1402 (Lift 7), 1/F, Innovation Centre, AC1, City University of Hong Kong,
83 Tat Chee Avenue, Kowloon Tong, Kowloon,
|Enquiry Tel:||2784 4245|
For seat reservation, please fax the Registration Form to (852)-2788 7579 on / before 21 December 2012.