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Optoelectronics Laboratory
City University of Hong Kong |
Last update : 17 July 2006
Welcome to EBL-100L pattern gallary
EBL-100L nanowriter has been installed and used in our laboratory for over 10 years. With its unique function, we can generate a wide variety of patterns on resist, (One of the example is the micro-scale City University logo shown at the left column) and tranferred them to the underlying layers using our in-house microfabrication facilities.
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| Fresnel lens array
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a section of Fresnel len |
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| 30nm Au/Pd metal lines on Si wafer
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Curved pattern on PMMA resist |
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| MSM diode on coplanar strips
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Nanobox array
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| Dots array on PMMA resist |
AFM Calibration mark
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| City U logo digital hologram |
Nanowire electrode patterning |
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500nm period grating for DWDM waveguide filter |
Single mode polymer waveguide |
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a section of polymer AWG |
200nm hexagonal dots array |